帽层在控制过孔挤压统计变化中的作用及机理研究

Golareh Jalilvand, Tengfei Jiang
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引用次数: 3

摘要

这项工作考察了金属帽层在通过挤压控制中的作用,并探讨了潜在的机制。沉积Ta作为盖层材料,可以有效地减少通过挤压的统计扩散。研究了未涂覆和Ta-capped两种参考过孔的挤压与微观结构的关系。对Ta cap/via界面进行了热力学表征和TEM表征。在晶粒交界处观察到空洞的形成。结果表明,通过晶界的质量输运是造成挤压统计变化的重要原因,而Ta帽层可以有效地抑制这种变化,帽层也减少了孔隙的形成。讨论了影响挤压的其他因素,包括界面扩散和位错滑动。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Study of the Effect and Mechanism of a Cap Layer in Controlling the Statistical Variation of Via Extrusion
This work examines the effect of a metallic cap layer in controlling via extrusion and explores the underlying mechanisms. Ta was deposited as the cap material, which was very effective in reducing the statistical spread of via extrusion. The correlation between extrusion and microstructure of the vias was investigated and compared for the reference uncoated vias and the Ta-capped vias. Thermo-mechanical characterization as well as TEM characterization of the Ta cap/via interface were also carried out. Void formation at grain junctures were observed. The results suggest that mass transport through grain boundaries plays an important role in causing the statistical variation of extrusion, which can be effectively suppressed by the Ta cap. Void formation was also reduced by the cap layer. Additional factors affecting extrusion, including interfacial diffusion and dislocation glide, were also discussed.
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