直线边缘粗糙度测量的直接比较扫描电镜和计量倾斜原子力显微镜的参考计量

IF 1.5 2区 物理与天体物理 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
R. Kizu, I. Misumi, A. Hirai, S. Gonda
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引用次数: 5

摘要

摘要背景:传统的扫描电子显微镜(SEM)用于二维顶视图测量,是一种经典的线边缘粗糙度(LER)测量技术,无法测量纳米尺度线图案的三维结构。对于LER测量,SEM测量生成3D侧壁粗糙度的单一线边缘轮廓,尽管线边缘轮廓在3D侧壁的每个高度上都是不同的。目的:开发一种基于SEM的LER测量技术的评估方法,并验证三维侧壁形状如何反映在SEM的二维结果中。方法:通过扫描电镜和原子力显微镜(AFM)的尖端倾斜技术,能够测量三维侧壁的直线模式的相同位置进行直接比较。线条图案由于其制造工艺而在侧壁上具有垂直条纹。利用功率谱密度、高程相关函数和自相关函数对实测线边缘轮廓进行分析。结果:扫描电镜(SEM)和原子力显微镜(AFM)测得的线边缘轮廓除噪声外吻合较好。频率和尺度分析表明,与AFM相比,SEM剖面含有高噪声,并且失去了自仿射分形的性质。结论:在侧壁有垂直条纹的线型情况下,扫描电镜剖面与三维侧壁形状基本一致。基于原子力显微镜的LER测量技术可作为LER测量的参考方法,用于评价其他LER测量技术。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Direct comparison of line edge roughness measurements by SEM and a metrological tilting-atomic force microscopy for reference metrology
Abstract. Background: Conventional scanning electron microscopy (SEM) that is used for 2D top-view metrology, a classical line edge roughness (LER) measurement technique, is incapable of measuring 3D structures of a nanoscale line pattern. For LER measurements, SEM measurement generates a single line-edge profile for the 3D sidewall roughness, although the line-edge profile differs at each height in the 3D sidewall. Aim: To develop an evaluation method of SEM-based LER measurement techniques and to verify how the 3D sidewall shape is reflected in the SEM’s 2D result. Approach: Direct comparison by measuring an identical location of a line pattern by SEM and an atomic force microscopy (AFM) with the tip-tilting technique that is capable of measuring the 3D sidewall. The line pattern has vertical stripes on the sidewall due to its fabrication process. Measured line edge profiles were analyzed using power spectral density, height-height correlation function, and autocorrelation function. Results: Line edge profiles measured by SEM and AFM were well matched except for noise level. Frequency and scaling analyses showed that SEM profile contained high noise and had lost a property of self-affine fractals in contrast to AFM. Conclusions: In the case of the line pattern with vertical stripes on the sidewall, SEM profile is generally consistent with 3D sidewall shape. The AFM-based LER measurement technique is useful as LER reference metrology to evaluate other LER measurement techniques.
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来源期刊
CiteScore
3.40
自引率
30.40%
发文量
0
审稿时长
6-12 weeks
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