基于统计方法的模拟CMOS电路可靠性估计

A. Kuntman, H. Kuntman
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摘要

随着现代CMOS技术的不断缩小,模拟电路设计人员在设计中面临着严重的可靠性问题。这些问题是由热载流子注入、负偏置和正偏置温度不稳定性(N/PBTI)和温度相关介质击穿(TDDB)等物理效应引起的。因此,对这些退化机制引起的偏差进行估计是稳健设计的一个重要因素。尽管由于集成电路技术的进步,数字信号处理变得越来越强大,许多类型的信号处理确实已经转移到数字领域,但在许多复杂和高性能的系统中,模拟电路仍然是必不可少的。这是因为自然发生的信号是模拟的。这意味着,模拟电路充当了现实世界和数字系统之间的桥梁。在模拟信号处理中,文献中提出了许多电路拓扑,包括有源滤波器,振荡器,阻抗模拟器等,这些电路拓扑具有很大的应用领域,范围从几Hz水平的极低频率到GHz水平的RF应用;换句话说,从生物医学和声纳信号到认知无线电和加密通信。一些研究已经在MOS结构中进行了这些降解效应,并出现在文献中。一般来说,在大多数可靠性研究中都提出并使用了物理模型。但是,物理模型的制备困难似乎是这类模型最重要的缺点。因此,一些研究引入了基于实验结果观察的统计方法来克服物理模型的这些缺点。本讲座涉及NMOS和PMOS晶体管的漏极电流和阈值电压的退化建模的统计方法。利用所获得的观测结果,对降解的影响进行了统计研究,并引入了新的统计方法来替代文献中给出的统计方法。所引入的统计模型不依赖于实现技术,具有仿真时间短、精度高的特点。通过实际电路设计实例验证了该方法的准确性。本综述的所有数据均来自伊斯坦布尔大学和伊斯坦布尔技术大学近期开展的研究工作。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
On the Reliability Estimation of Analog CMOS Circuits Based on Statistical Methods
Since modern CMOS technologies are continuously scaling down, the analog circuit designers are faced to serious reliability problems in their designs. These problems are caused by physical effects such as hot carrier injection, negative and positive bias temperature instability (N/PBTI) and temperature dependent dielectric breakdown (TDDB). Therefore, it is an important factor for a robust design to estimate the deviations caused by these degradation mechanisms.Although digital signal processing is becoming increasingly more powerful and many types of signal processing have indeed moved to digital domain due to the advances in IC technology, analog circuits are still fundamentally necessary in many complex and high performance systems. This is caused by the reality that naturally occurring signals are analog. That means, analog circuits act as a bridge between the real world and digital systems. In analog signal processing, many circuit topologies including active filters, oscillators, immittance simulators etc. have been proposed in the literature which find a large application area, ranging from very low frequencies at several Hz levels to RF applications operating at GHz level; in other words, from biomedical and sonar signals to cognitive radio and encrypted communications.Several works have been performed on these degradation effects in MOS structures and appeared in the literature. Generally, physical models were proposed and used in most of the reliability studies. But, difficulties in preparation of physical models seem to be the most important disadvantages of these type models. As a result, statistical method based observation of experimental results have been introduced in some works to overcome these disadvantages of physical models.This talk deals with statistical methods for modelling of the degradation caused deviations in the drain current and threshold voltage of the NMOS and PMOS transistors. Using the observation results obtained, the effect of degradation was investigated statistically and new statistical methods were introduced to be an alternative to those given in the literature. The statistical models introduced are independent of the realization technology, exhibiting short simulation time and high accuracy. The accuracy is proven on circuit design examples from the real World. All data in this review is taken from the recent research works performed in Istanbul University and Istanbul Technical University.
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