溅射Pb(Mn, Nb)O3-PZT薄膜的结构和铁电性能

K. Wasa, K. Kawano, H. Adachi, T. Matsushima, K. Nishida, T. Yamamoto, I. Kanno, H. Kotera
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引用次数: 1

摘要

采用磁控溅射技术在(001)SrTiO3和(001)MgO衬底上制备了PZT基三元钙钛矿xPb(Mn, Nb)O3-(1−x)PZT异质外延薄膜。异质外延薄膜表现为单c畴/单晶结构,具有高Ec, Ec>180kV/cm,薄膜厚度x=0.06, 300nm-5mm。在膜厚> 0.5mm时,三元钙钛矿薄膜呈现松弛结构。然而,居里温度Tc为600°C,比本体陶瓷高250°C。溅射薄膜的残余极化率高达100mC/cm2。由于溅射薄膜呈现出松弛的结构,因此排除了平面内压缩模型来解释当前高Tc现象的机制。Tc升高的机制尚不清楚。目前的pzt基三元钙钛矿薄膜是一种外来材料。本文介绍了压电MEMS的结构和特殊的铁电特性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Structure and ferroelectric properties of sputtered Pb(Mn, Nb)O3-PZT thin films
Heteroepitaxial thin films of PZT-based ternary perovskite, xPb(Mn, Nb)O3-(1−x)PZT, were fabricated by magnetron sputtering on (001)SrTiO3 and (001)MgO substrates. The heteroepitaxial thin films showed single c-domain /single crystal structure and exhibit hard piezoelectric behavior with high Ec, Ec>180kV/cm, at x=0.06 for the film thickness, 300nm–5mm. The ternary perovskite thin films showed relaxed structure at the film thickness > 0.5mm. However, Curie temperature Tc is 600°C which is 250°C higher than bulk ceramic values. The sputtered thin films exhibit remnant polarization being as high as 100mC/cm2. The in-plane compression model is ruled out for a mechanism of the present higher Tc phenomena, since the sputtered thin films show relaxed structure. The mechanism of the higher Tc is unclear. The present thin films of PZT-based ternary perovskite are exotic materials. This paper describes the structure and the exotic ferroelectric properties in relation to the possible application for piezoelectric MEMS.
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