SiC晶体生长数值计算的新进展

K. Kakimoto, S. Nakano
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引用次数: 1

摘要

研究了氮和铝作为掺杂杂质eŠect对物理气相输运(PVT)形成的SiC多型(C或Si面对4H和6H衬底)稳定性的影响。利用经典热力学成核理论对多型体的稳定性进行了分析,并对PVT炉内热、质量和物质传递的全局模型进行了数值计算。结果表明,以C面4H和6HSiC为晶种,在生长晶体中掺氮时,4HSiC的形成比6HSiC的形成更稳定。相比之下,当使用Si面对4H和6HSiC种子晶体时,6HSiC的形成比4HSiC的形成更有利。同时,以铝为掺杂剂,以6HSiC的C面和Si面作为种子晶时,4HSiC的形成比6HSiC的形成更稳定。在4HSiC的C面和Si面作为种子晶体的情况下,6HSiC比4HSiC更容易生长。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Recent developments of numerical calculation in crystal growth of SiC
The eŠect of nitrogen and aluminum as doped impurities on the stability of SiC polytypes (Cor Siface 4H and 6H substrates) formed by physical vapor transport (PVT) was investigated. The stability of the polytypes was analyzed using classical thermodynamic nucleation theory with numerical results obtained from a global model including heat, mass and species transfer in a PVT furnace. The results reveal that the formation of 4HSiC was more stable than that of 6HSiC when a grown crystal was doped with nitrogen using Cface 4Hand 6HSiC as seed crystals. In contrast, formation of 6HSiC was favored over 4HSiC when Siface 4Hand 6H SiC seed crystals were used. Meanwhile, the formation of 4HSiC was more stable than that of 6HSiC when aluminum was the dopant and Cand Sifaces of 6HSiC were used as seed crystals. 6HSiC was preferred to grow rather than 4HSiC in the cases of C and Sifaces of 4HSiC as seed crystals.
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