在硅衬底外延生长的增强相干全氮超导量子比特

Sunmi Kim, H. Terai, T. Yamashita, W. Qiu, T. Fuse, F. Yoshihara, S. Ashhab, K. Inomata, K. Semba
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引用次数: 8

摘要

我们在Si衬底上开发了基于NbN/AlN/NbN外延约瑟夫森结的超导量子比特,有望克服基于Al/AlOx/Al结的量子比特的缺点。全氮量子比特具有很大的优势,例如抗氧化的化学稳定性(导致更少的双能级波动),外延隧道势垒的可行性(进一步减少能量弛豫和去相),NbN的超导间隙比Al的大5.2 meV(抑制准粒子的激发)。在氮化结的外延生长中,用TiN缓冲层取代传统的MgO衬底,我们证明了量子比特的能量松弛时间\({T}_{1}=16.3 {\mu }\text{s}\)和自旋回波消相时间\({T}_{2}=21.5 {\mu }\text{s}\)。量子相干性的这些显著改进可以解释为与先前报道的具有MgO衬底的基于nbn的量子位相比,介电损耗降低(\({T}_{1}\approx {T}_{2}\approx 0.5 {\mu }\text{s}\))。这些结果是构建超导量子硬件新平台的重要一步。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Enhanced-coherence all-nitride superconducting qubit epitaxially grown on Si substrate
We have developed superconducting qubits based on NbN/AlN/NbN epitaxial Josephson junctions on Si substrates which promise to overcome the drawbacks of qubits based on Al/AlOx/Al junctions. The all-nitride qubits have great advantages such as chemical stability against oxidation (resulting in fewer two-level fluctuators), feasibility for epitaxial tunnel barriers (further reducing energy relaxation and dephasing), and a larger superconducting gap of ~ 5.2 meV for NbN compared to ~ 0.3 meV for Al (suppressing the excitation of quasiparticles). Replacing conventional MgO by a Si substrate with a TiN buffer layer for epitaxial growth of nitride junctions, we demonstrate a qubit energy relaxation time \({T}_{1}=16.3 {\mu }\text{s}\) and a spin-echo dephasing time \({T}_{2}=21.5 {\mu }\text{s}\). These significant improvements in quantum coherence are explained by the reduced dielectric loss compared to previously reported NbN-based qubits with MgO substrates (\({T}_{1}\approx {T}_{2}\approx 0.5 {\mu }\text{s}\)). These results are an important step towards constructing a new platform for superconducting quantum hardware.
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