高级光刻工艺的采样点选择算法

计算机工程与设计 Pub Date : 2022-09-23 DOI:10.1109/SEEDA-CECNSM57760.2022.9932920

Aris Magklaras, Christos G Gogos, Panagiotis Alefragis, Christos Valouxis, A. Birbas

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引用次数: 0

摘要

光刻工艺是半导体工业中最关键的工艺之一，因为它推动了摩尔定律和微电子技术的发展。对精度、吞吐量和图像质量的硬约束要求软件控制算法和高精度测量。在这样严格的环境和需求中，需要满足质量和性能目标，测量的最佳设计是非常必要的。在本文中，我们提出了一种实验优化设计算法，该算法将使该过程能够在高度竞争的时间分数内获得g -最优结果，同时确保光刻机的吞吐量最优。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Sampling Points Selection Algorithm For Advanced Photolithography Process

Photolithography process is one of the most critical in the semiconductor industry since it drives the Moore’s law and the advances in microelectronics in general. Hard constraints on precision, throughput and image quality require software control algorithms and high precision measurements. In such strict environment and requirements, where quality and performance goals need to be met, the optimal design of the measurements is more than necessary. In this paper we propose an Optimal Design of Experiments Algorithm that will enable the process to be able to obtain G-optimal result in a highly competitive time fraction that will ensure at the same time the throughput optimality of the photolithography machines.

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来源期刊

计算机工程与设计

自引率

0.00%

发文量

20353

期刊介绍： Computer Engineering and Design is supervised by China Aerospace Science and Industry Corporation and sponsored by the 706th Institute of the Second Academy of China Aerospace Science and Industry Corporation. It was founded in 1980. The purpose of the journal is to disseminate new technologies and promote academic exchanges. Since its inception, it has adhered to the principle of combining depth and breadth, theory and application, and focused on reporting cutting-edge and hot computer technologies. The journal accepts academic papers with innovative and independent academic insights, including papers on fund projects, award-winning research papers, outstanding papers at academic conferences, doctoral and master's theses, etc.