ITO肖特基触点在β-Ga2O3上的温度依赖性性能

Xinyi Xia, M. Xian, Chaker Fares, F. Ren, M. Tadjer, S. Pearton
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引用次数: 9

摘要

将溅射铟锡氧化物(ITO)用作轻n型(n ~ 1016 cm−3)β-Ga2O3的整流触点,发现在500 K以下表现出优异的肖特基特性,并且在此温度下没有热驱动降解。从电流-电压特性中提取的势垒高度在300 K时为1.15±0.04 eV,在500 K时为0.78±0.03 eV,载流子的热离子行为在像力的作用下降低了肖特基势垒,主导了载流子在低温下的输运。在300、400和500 K下,击穿电压分别为246、185和144 V。在600 K时,二极管遭受不可逆的热损伤。二极管的开/关比>105,反向偏置高达100 V。在较高的反向电压下,电流与电压呈I∝Vn关系,表明陷阱辅助空间电荷限制传导(SCLC)机制。当反向电压在300和400 K时大于100 V,在500 K时小于100 V时,我们观察到这种SCLC关系。ITO还可以用于在高掺杂Ga2O3上制造欧姆接触,这表明完全光透明功率器件的可能性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Temperature dependent performance of ITO Schottky contacts on β-Ga2O3
Sputtered indium tin oxide (ITO) was used as a rectifying contact on lightly n-type (n ∼ 1016 cm−3) β-Ga2O3 and found to exhibit excellent Schottky characteristics up to 500 K, with no thermally driven degradation to this temperature. The barrier height extracted from current–voltage characteristics was 1.15 ± 0.04 eV at 300 K and 0.78 ± 0.03 eV at 500 K, with thermionic behavior of charge carriers over the image force lowered Schottky barriers dominating the carrier transport at low temperatures. The breakdown voltages were 246, 185, and 144 V at 300, 400 and 500 K, respectively. At 600 K, the diodes suffered irreversible thermal damage. The diode on/off ratio was >105 for reverse biases up to 100 V. At higher reverse voltage, the current shows an I ∝ Vn relationship with voltage, indicating a trap-assisted space-charge-limited conduction (SCLC) mechanism. We observed this SCLC relation when the reverse voltage was larger than 100 V for 300 and 400 K and at <100 V at 500 K. The ITO can also be used to make Ohmic contacts on heavily doped Ga2O3 suggesting the possibility of completely optically transparent power devices.
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