垂直2T NOR (V2T)架构为NOR闪存技术提供可扩展和低功耗解决方案

H. Lue, T. Hsu, T. Yeh, Wei-Chen Chen, C. Lo, Chiatze Huang, Guan-Ru Lee, C. Chiu, Keh-Chung Wang, Chih-Yuan Lu
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引用次数: 10

摘要

NOR闪存已经停止扩展很多年了。然而,近年来,各种5G和物联网应用或可穿戴设备对NOR闪存的新需求越来越多,强烈要求NOR的新技术进步。在这项工作中,我们开发了一种新的垂直2T (V2T) NOR闪存架构,不仅提供扩展能力,而且提供低功耗解决方案。我们利用标准3D NAND工艺开发了一种垂直2T NOR,其电池尺寸比传统平面1T NOR更小。开发了先进的高k金属栅(HK/MG)集成,提供高性能的BE-MANOS电荷捕获装置,具有出色的1M耐久性和保持可靠性。2T NOR架构提供低电压读取(~1V),与先进的CMOS电路兼容,无需电荷泵送以节省功率。我们还提出了未来V2T NOR的技术扩展,采用铁电存储器件(FeFET)和3DIC芯片集成,以拓宽NOR技术在嵌入式闪存和内存计算(CIM)中的应用领域。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Vertical 2T NOR (V2T) Architecture to Enable Scaling and Low-Power Solutions for NOR Flash Technology
NOR Flash has stopped scaling for many years. However, recently there are increasingly new demands of NOR Flash in various 5G and IoT applications or wearable devices that strongly require new technology advancement of NOR. In this work, we developed a new vertical 2T (V2T) NOR Flash architecture that provides not only scaling capability but also low-power solutions. We leveraged the process of standard 3D NAND to develop a vertical 2T NOR that produces even smaller cell size than conventional planar 1T NOR. Advanced high-K metal-gate (HK/MG) integration is developed to provide high-performance BE-MANOS charge-trapping device with excellent 1M endurance and retention reliability. The 2T NOR architecture provides low-voltage read (~1V) that is compatible with advanced CMOS circuits without charge pumping to save power. We also suggest future technology extensions of the V2T NOR by adopting the ferroelectric memory devices (FeFET) and the 3DIC chiplets integration to broaden the applications fields of NOR technology in embedded Flash and computing in memory (CIM).
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