亚微米砷化镓器件中的热载流子诱导光子发射

C. Tedesco, M. Manfredi, A. Paccagnella, E. Zanoni, C. Canali
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引用次数: 11

摘要

作者提出了在高漏极电压下发生的GaAs mesfet和AlGaAs-GaAs -GaAs高电子迁移率晶体管(hemt)中的冲击电离现象的研究。这一分析是通过分析由冲击电离和光发射产生的空穴聚集而产生的栅极电流来进行的。本文给出了栅极电流与通道内模拟电场的关系,1.1 ~ 3.1 ev能量范围内的电致发光光谱,以及电子与空穴电流积的积光强的相关关系,表明复合过程是可见光发射的主要机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Hot carrier induced photon emission in submicron GaAs devices
The authors present a study of impact ionization phenomena in GaAs MESFETs and AlGaAs-GaAs HEMTs (high electron mobility transistors) occurring at high drain voltages. This analysis has been performed by analyzing the gate current due to the collection of holes generated by impact ionization and light emission. The authors present the relationship of gate current with simulated electric field in the channel, the electroluminescence spectra in the 1.1-3.1-eV energy range, and the correlation of integrated light intensity with the product of the electron and hole current which suggests that the recombination process is the main mechanism for visible light emission.<>
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