一种新的微光学元件驱动氧化制备工艺

2007 IEEE 20th International Conference on Micro Electro Mechanical Systems (MEMS) Pub Date : 2007-01-01 DOI:10.1109/MEMSYS.2007.4432968

J. Ohara, K. Kano, Y. Takeuchi

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引用次数: 2

摘要

我们通过应用DRIE (Deep Reactive Ion Etching)工艺和热氧化技术，开发了一种新的微光学元件制造工艺，使我们能够在硅衬底上制造微透镜和棱镜，而无需组装。这个过程也可以形成其他光学元件，如光波导通过改变掩模模式。

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A new fabrication process for micro optical elements using drie and oxidation

We have developed a new fabrication process of micro optical elements by applying DRIE (Deep Reactive Ion Etching) process and thermal oxidation, which enables us to make micro lenses and prisms on a silicon substrate without assembling. This process can also form other optical elements, such as light wave-guides by changing mask pattern.

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来源期刊

2007 IEEE 20th International Conference on Micro Electro Mechanical Systems (MEMS)

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