利用3C-SiC/Si异质结构的超灵敏光电压阻传感器

T. Nguyen, T. Dinh, Abu Riduan Md Foisal, Hoang‐Phuong Phan, Tuan‐Khoa Nguyen, N. Nguyen, D. Dao
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引用次数: 2

摘要

本文首次报道了在硅(Si)上生长的立方碳化硅(3C-SiC)纳米膜的超灵敏光压阻效应。通过耦合光电效应和控制半导体中空穴/电子的分布,显著提高了传感器的灵敏度。与传统MEMS传感器相比,该方法可将应变传感器的测量因子(GF)提高至少三个数量级。观察到的GF约为58,000,这是迄今为止半导体压阻式传感器报道的最高GF。因此,我们的研究结果可以用于开发超灵敏的机械传感器和MEMS/NEMS传感应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Ultra-Sensitive OPTO-Piezoresistive Sensors Utilising 3C-SiC/Si Heterostructures
Here we report for the first time an ultra-sensitive opto-piezoresistive effect in cubic silicon carbide (3C-SiC) nanofilms grown on silicon (Si). The sensitivity of the sensor was significantly enhanced by coupling the photovoltaic effect and controlling distribution of hole/electron in semiconductors. By applying this method, the gauge factor (GF) of strain sensors can be improved at least three orders of magnitude compared to conventional MEMS sensor. A GF of approximately 58,000 was observed, which is the highest GF reported for semiconductor piezoresistive sensors to date. Consequently, our findings can be deployed to develop ultra-sensitive mechanical sensors and MEMS/NEMS sensing applications.
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