惠更斯源激励在MoM表面电流EFIE配方中的应用

D. Leugner, H. Bruns, H. Singer
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引用次数: 2

摘要

本文将等价定理(惠更斯原理)与矩量法(MoM)表面电流公式相结合,改进了电磁兼容领域中一类问题的计算。特别令人感兴趣的是孔和槽对外壳内部场形成的影响。为了实现基于MoM EFIE公式的有效孔径处理,为了满足界面处的连续性方程,电MoM电流和电等效源(惠更斯源)必须电连接。我们观察到,用孔径内的惠更斯源代替原激励,可以避免EFIE在共振处导致假内场的不稳定性。在第一个标准MoM计算中,得到了结构的电流分布。然后在孔径平面上用惠更斯电流代替原激励。为了计算内部电流分布,需要进行第二次MoM计算。这种一步一步的EFIE程序在计算上比双层电流方法更有效。数值上的努力几乎减少了四分之一。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Use of Huygens source excitation in a MoM surface-current EFIE formulation
In this paper the equivalence theorem (Huygens principle) is applied in conjunction with a method of moments (MoM) surface current formulation in order to improve the computation of a certain class of problems arising in the area of EMC. Of special interest is the effect of holes and slots upon the forming of the interior fields of enclosures. For an effective aperture treatment based on a MoM EFIE formulation the electric MoM currents and the electric equivalent sources (Huygens sources) have to be galvanically connected in order to satisfy the continuity equation at the interface. It is observed that one can circumvent instabilities of the EFIE at resonances leading to false interior fields by replacing the original excitation by Huygens sources in the aperture. In a first standard MoM computation the current distribution of the structure is gained. Then the original excitation is replaced by Huygens currents in the aperture plane. A second MoM computation is necessary to compute the internal current distribution. Such a step-by-step EFIE procedure is computationally more efficient than a double-layer current approach. The numerical effort is reduced by almost a factor of four.
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