双层催化剂及其退火对氮化镓纳米线生长的影响

D. Kuo, Wei-Ting Shen
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引用次数: 1

摘要

本文报道了在金属双层催化剂包覆基底和双层催化剂退火基底上,通过氮化镓与NH3的反应,在800℃下蒸发合成氮化镓纳米线。GaN生长前催化剂层的退火温度分别为700℃和850℃。采用Au、Ni、Al、In组成了双层金属催化剂。研究了双层催化剂的堆叠顺序和退火条件对生长差异的影响。了解这些差异有助于了解生长机制。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The effects of bi-layer catalysts and its annealing on the growth of GaN nanowires
We report an evaporation reaction to synthesize GaN nanowires at 800°C on metallic bi-layer catalyst-coated substrates and on the bi-layer catalyst-annealed substrates through the reaction of GaN and NH3. The annealing temperatures of catalyst layers before the GaN growth were 700°C and 850°C. Bi-layer metallic catalysts were constituted with Au, Ni, Al, and In. The growth differences caused by the stacking sequence of bi-layer catalysts and the annealing conditions were investigated. The understanding of those differences can help to know the growth mechanism.
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