覆盖计量的下一代光刻在CMS

2007 7th IEEE Conference on Nanotechnology (IEEE NANO) Pub Date : 2007-08-01 DOI:10.1109/NANO.2007.4601351

Y. Ku, H. Tai, Chia-Teng Chang

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引用次数: 0

摘要

测量标准中心(CMS)有一个光学覆盖计量的研究项目。本工作的主要目标是提高覆盖测量精度。开发了两个主线程，实现了新颖的片内覆盖目标设计和最佳算法。前者希望证明在产品器件的有源区域内测量叠加误差的能力。后者用于从图像细节中提取最多的信息。

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Overlay metrology for next generation lithography at CMS

The center for measurement standards (CMS) has a research program in optical overlay metrology. The main goal of this work is to improve overlay measurement accuracy. Two main threads are developed to the work - novel in-chip overlay target design, and best algorithm. The former is hoped to prove a capability for measuring overlay error inside the active area of product devices. The later is for extracting the most from image detail.

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2007 7th IEEE Conference on Nanotechnology (IEEE NANO)

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