{"title":"不同临时键合材料对通硅中间层(TSI)晶圆翘曲的影响","authors":"W. Loh, K. Chui","doi":"10.1109/EPTC50525.2020.9315102","DOIUrl":null,"url":null,"abstract":"This paper investigate the evolution of wafer warpage at different stages of a Through Si interposer (TSI) process flow, with reference to 2 different types of temporary bonding material. Comparison was done between solvent based and mechanical based debonding adhesives. The TSI fabrication includes 4 layers Cu damascene (BEOL) metal, front-side UBM, post-bonding backgrinding, TSV reveal etch and backside UBM.","PeriodicalId":6790,"journal":{"name":"2020 IEEE 22nd Electronics Packaging Technology Conference (EPTC)","volume":"70 1","pages":"268-272"},"PeriodicalIF":0.0000,"publicationDate":"2020-12-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Wafer Warpage Evaluation of Through Si Interposer (TSI) with Different Temporary Bonding Materials\",\"authors\":\"W. Loh, K. Chui\",\"doi\":\"10.1109/EPTC50525.2020.9315102\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper investigate the evolution of wafer warpage at different stages of a Through Si interposer (TSI) process flow, with reference to 2 different types of temporary bonding material. Comparison was done between solvent based and mechanical based debonding adhesives. The TSI fabrication includes 4 layers Cu damascene (BEOL) metal, front-side UBM, post-bonding backgrinding, TSV reveal etch and backside UBM.\",\"PeriodicalId\":6790,\"journal\":{\"name\":\"2020 IEEE 22nd Electronics Packaging Technology Conference (EPTC)\",\"volume\":\"70 1\",\"pages\":\"268-272\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-12-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 IEEE 22nd Electronics Packaging Technology Conference (EPTC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EPTC50525.2020.9315102\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE 22nd Electronics Packaging Technology Conference (EPTC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EPTC50525.2020.9315102","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Wafer Warpage Evaluation of Through Si Interposer (TSI) with Different Temporary Bonding Materials
This paper investigate the evolution of wafer warpage at different stages of a Through Si interposer (TSI) process flow, with reference to 2 different types of temporary bonding material. Comparison was done between solvent based and mechanical based debonding adhesives. The TSI fabrication includes 4 layers Cu damascene (BEOL) metal, front-side UBM, post-bonding backgrinding, TSV reveal etch and backside UBM.