(反)铁电记忆材料氧化锆(ZrO2)极化开关的原子尺度成像

S. Lombardo, C. Nelson, K. Chae, S. Reyes-Lillo, M. Tian, N. Tasneem, Z. Wang, M. Hoffmann, D. Triyoso, S. Consiglio, K. Tapily, R. Clark, G. Leusink, K. Cho, A. Kummel, J. Kacher, A. Khan
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引用次数: 6

摘要

通过原位高分辨率透射电子显微镜(HRTEM)偏置,首次报道了功能性多晶二元氧化物中极化开关的直接原子尺度可视化。反铁电(AFE) ZrO2被用作模型系统,这对于商用dram和新兴的nvm(通过工作功能工程)非常重要。我们观察到(1)单个晶粒内畴的明显移动和聚结,(2)原子排列和晶相的剧烈变化——两者都在高于AFE开关测量的临界电压的电压下。类似的协同原位结构电特性可以为理解和设计铁电和afe存储器件中保留、疲劳、可变性、亚矫顽力开关和模拟状态的微观机制铺平道路。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Atomic-scale imaging of polarization switching in an (anti-)ferroelectric memory material: Zirconia (ZrO2)
Direct, atomic-scale visualization of polarization switching in a functional, polycrystalline, binary oxide via insitu high-resolution transmission electron microscopy (HRTEM) biasing is reported for the first time. Antiferroelectric (AFE) ZrO2 was used as the model system, which is important for commercial DRAMs and as emerging NVMs (through work-function engineering). We observed (1) clear shifting and coalescing of domains within a single grain, and (2) dramatic changes of the atomic arrangements and crystalline phases-both at voltages above the critical voltage measured for AFE switching. Similar synergistic in-situ structural-electrical characterization can pave the way to understand and engineer microscopic mechanisms for retention, fatigue, variability, sub-coercive switching and analog states in ferroelectric and AFE-based memory devices.
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