CMOS FEOL/ beol嵌入式垂直耦合电容式和压阻式谐振器的TiN-C通用工艺

Chao-Yu Chen, A. Zope, Ming-Huang Li, Sheng-Shian Li
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引用次数: 2

摘要

本文提出了一种用于高分辨率振荡传感器的扩展氮化钛复合材料(TiN-C) CMOS-MEMS平台,该平台试图同时验证(i)垂直耦合谐振器(VCR)对结构和(ii)嵌入式压阻(PZR)转导机制在单个芯片上。采用垂直耦合设计理念,通过VCR对之间的高机械刚度耦合器,可以显著提高线性度,同时最大限度地减少器件占地面积。另一方面,PZR传感技术被进一步用于产生更好的信噪比(SNR),具有较高的非硅化多晶硅电阻的测量因子。为了在标准CMOS中实现这样的设计理念,提出了采用“衬底蚀刻优先”方法的增强型TiN-C平台,以防止在结构释放步骤中钨孔(W-VIAs)被蚀刻。因此,我们成功展示了一个3阵列VCR,与传统的平面9阵列VCR相比,其功率处理能力超过3倍。此外,与基于单个feol嵌入式VCR (Q > 4,000)的纯电容操作相比,亚mw电容驱动/poly-2传感方案在背景地板上减少了7倍。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Generic TiN-C Process for CMOS FEOL/BEOL-Embedded Vertically-Coupled Capacitive and Piezoresistive Resonators
An extended titanium nitride composite (TiN-C) CMOS-MEMS platform for high-resolution oscillating sensors is presented in this work that attempts to simultaneously validate the (i) vertically-coupled resonator (VCR) pair structure and (ii) embedded piezoresistive (PZR) transduction mechanism in a single chip. With a vertically-coupled design concept, it is beneficial to significantly increase the linearity through the high mechanical stiffness couplers between VCR pair while minimizing the device footprint. On the other hand, the PZR sensing technique is further employed to yield a better signal-to-noise ratio (SNR) with a high gauge factor from non-silicided polysilicon resistor. To accomplish such a design concept in standard CMOS, the enhanced TiN-C platform with "substrate-etching-first" approach is proposed to prevent the tungsten vias (W-VIAs) being etched during the structure release step. As a result, we have successfully demonstrated a 3-array VCR with more than 3x power handling capability in comparison to the conventional planar 9-array counterparts. Moreover, the sub-mW capacitive driving/poly-2 sensing scheme offers a 7x reduction on the background floor than purely capacitive operation based on a single FEOL-embedded VCR with Q > 4,000.
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