利用集成二维衍射光栅的微拉伸试样对氮化硅薄膜进行力学表征

J. Gaspar, Y. Nurcahyo, P. Ruther, O. Paul
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引用次数: 8

摘要

本文报道了集成二维反射光栅的氮化硅(SiNx)薄膜微拉伸试样的力学特性。通过施加轴向力,结构在纵向和横向上分别产生伸长和收缩的机械反应。通过测量单色光照射光栅产生的衍射图,实时监测光栅两个周期的相应变化。因此,应变分量在结构中被局部评估。通过将这种光学技术与先前开发的高效测试结构相结合,原则上可以从单个测试结构的测量中提取材料的杨氏模量E、泊松比nu、残余应变系数和应力信号以及断裂强度sigma0。在这里,我们演示了氮化膜的E, epsivres,信号和sigma0的提取。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Mechanical characterization of silicon nitride thin-films using microtensile specimens with integrated 2D diffraction gratings
This paper reports on the mechanical characterization of microtensile specimens made of silicon nitride (SiNx) thin-films with integrated 2D reflective gratings. By applying an axial force, the structures respond mechanically with an elongation and contraction in the longitudinal and transversal directions, respectively. The corresponding variations of both periods of the grating are monitored in real time by measuring the diffraction pattern resulting from the illumination of the grating with monochromatic light. The strain components are thus evaluated locally in the structure. By integrating such an optical technique with an efficient test structure previously developed, the extraction of materials' Young's modulus E, Poisson's ratio nu, residual strain epsivres and stress sigmares and fracture strength sigma0 is in principle made possible from the measurement of a single test structure. Here we demonstrate the extraction of E, epsivres, sigmares and sigma0 of the nitride films.
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