R. Hadizadeh, A. Laitinen, Niko Kuusniemi, V. Blaschke, D. Molinero, Eoin O'Toole, M. Pinheiro
{"title":"MEMS可调谐电容器与RF SOI开关的低密度扇出非均匀集成","authors":"R. Hadizadeh, A. Laitinen, Niko Kuusniemi, V. Blaschke, D. Molinero, Eoin O'Toole, M. Pinheiro","doi":"10.4071/2380-4505-2019.1.000051","DOIUrl":null,"url":null,"abstract":"\n Using Low-Density Fan-Out (LDFO) packaging technology, a radio frequency (RF) microelectromechanical systems (MEMS) tunable capacitor array composed of electrostatically actuated beams on 180nm high-voltage CMOS silicon was heterogeneously integrated with a single-pole four-terminal (SP4T) RF switch on 180nm CMOS silicon-on-insulator (SOI). The primary objective of this study was to determine the manufacturability of this System-in-Package (SiP) design, which is proven at time zero through survival of the MEMS device based on acceptable MEMS performance metrics.\n In addition, the RF SOI switch provides high-voltage electrostatic discharge (ESD) protection for the MEMS device. Capacitive MEMS structures are particularly sensitive to unpredictable electrostatic charging scenarios, such as handling after package assembly and printed circuit board (PCB) surface mount processing. Consequently, resistance to dielectric breakdown by means of robust ESD protection is a very desirable quality. Integrating the RF switch in close proximity with the MEMS device not only enables the ability to withstand charging scenarios in excess of 1kV (human body model), it mitigates the impact of parasitics on RF performance by minimizing interconnect lengths and complexity.","PeriodicalId":14363,"journal":{"name":"International Symposium on Microelectronics","volume":"20 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2019-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Low-Density Fan-Out Heterogeneous Integration of MEMS Tunable Capacitor and RF SOI Switch\",\"authors\":\"R. Hadizadeh, A. Laitinen, Niko Kuusniemi, V. Blaschke, D. Molinero, Eoin O'Toole, M. Pinheiro\",\"doi\":\"10.4071/2380-4505-2019.1.000051\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\\n Using Low-Density Fan-Out (LDFO) packaging technology, a radio frequency (RF) microelectromechanical systems (MEMS) tunable capacitor array composed of electrostatically actuated beams on 180nm high-voltage CMOS silicon was heterogeneously integrated with a single-pole four-terminal (SP4T) RF switch on 180nm CMOS silicon-on-insulator (SOI). The primary objective of this study was to determine the manufacturability of this System-in-Package (SiP) design, which is proven at time zero through survival of the MEMS device based on acceptable MEMS performance metrics.\\n In addition, the RF SOI switch provides high-voltage electrostatic discharge (ESD) protection for the MEMS device. Capacitive MEMS structures are particularly sensitive to unpredictable electrostatic charging scenarios, such as handling after package assembly and printed circuit board (PCB) surface mount processing. Consequently, resistance to dielectric breakdown by means of robust ESD protection is a very desirable quality. Integrating the RF switch in close proximity with the MEMS device not only enables the ability to withstand charging scenarios in excess of 1kV (human body model), it mitigates the impact of parasitics on RF performance by minimizing interconnect lengths and complexity.\",\"PeriodicalId\":14363,\"journal\":{\"name\":\"International Symposium on Microelectronics\",\"volume\":\"20 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-12-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Symposium on Microelectronics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.4071/2380-4505-2019.1.000051\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Symposium on Microelectronics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.4071/2380-4505-2019.1.000051","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Low-Density Fan-Out Heterogeneous Integration of MEMS Tunable Capacitor and RF SOI Switch
Using Low-Density Fan-Out (LDFO) packaging technology, a radio frequency (RF) microelectromechanical systems (MEMS) tunable capacitor array composed of electrostatically actuated beams on 180nm high-voltage CMOS silicon was heterogeneously integrated with a single-pole four-terminal (SP4T) RF switch on 180nm CMOS silicon-on-insulator (SOI). The primary objective of this study was to determine the manufacturability of this System-in-Package (SiP) design, which is proven at time zero through survival of the MEMS device based on acceptable MEMS performance metrics.
In addition, the RF SOI switch provides high-voltage electrostatic discharge (ESD) protection for the MEMS device. Capacitive MEMS structures are particularly sensitive to unpredictable electrostatic charging scenarios, such as handling after package assembly and printed circuit board (PCB) surface mount processing. Consequently, resistance to dielectric breakdown by means of robust ESD protection is a very desirable quality. Integrating the RF switch in close proximity with the MEMS device not only enables the ability to withstand charging scenarios in excess of 1kV (human body model), it mitigates the impact of parasitics on RF performance by minimizing interconnect lengths and complexity.