Seon Yeong Kim, Hong-Gyu Park, Min-Jae Cho, D. Yang, Dai‐Hyun Kim, Dae‐Shik Seo
{"title":"液晶器件中HfO2薄膜溶液加工中的多层堆叠层以获得优异的电性能","authors":"Seon Yeong Kim, Hong-Gyu Park, Min-Jae Cho, D. Yang, Dai‐Hyun Kim, Dae‐Shik Seo","doi":"10.1149/2.004404SSL","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":11423,"journal":{"name":"ECS Solid State Letters","volume":"45 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2014-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Multi-Stacked Layer in the Solution Processing of HfO2 Films to Obtain Superior Electrical Performance in Liquid Crystal Devices\",\"authors\":\"Seon Yeong Kim, Hong-Gyu Park, Min-Jae Cho, D. Yang, Dai‐Hyun Kim, Dae‐Shik Seo\",\"doi\":\"10.1149/2.004404SSL\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":11423,\"journal\":{\"name\":\"ECS Solid State Letters\",\"volume\":\"45 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"ECS Solid State Letters\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1149/2.004404SSL\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"ECS Solid State Letters","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1149/2.004404SSL","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}