用于数据中心Tb/s光互连的3D硅光子中间体,具有双面组装有源元件和集成光电通过SOI硅孔

B. Sirbu, Y. Eichhammer, H. Oppermann, T. Tekin, J. Kraft, V. Sidorov, X. Yin, J. Bauwelinck, C. Neumeyr, Francisco Soares
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引用次数: 14

摘要

本文介绍了一种三维硅光子中间体的概念、制作、工艺和封装。这种硅光子中间体将无源光子和电子功能合并在一个芯片内。中间层填充有源光学和电子附加件,这些附加件使用热压缩键合倒装芯片连接到中间层。然后将中间介子本身倒装到玻璃和硅载体上,以进行进一步的测试。这种集成概念通过在中间器两侧组装每通道40Gb/s的光电元件,实现了高连接密度(Gb/s/mm²)。中间器两侧组件之间的通信由3dB带宽>28GHz的光学和电气tsv实现。一个单模光子层,设计为1.55 μ m波长集成在中间层中,用于光信号的路由和交换。本文描述了主要的制造和封装步骤,并给出了一些样机的评价结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
3D Silicon Photonics Interposer for Tb/s Optical Interconnects in Data Centers with Double-Side Assembled Active Components and Integrated Optical and Electrical Through Silicon Via on SOI
In this paper, we present the concept, fabrication, process and packaging of a 3D Si photonics interposer. This Si photonics interposer merges passive photonic and electronic functionalities within a single chip. The interposer is populated with active optical and electronic add-ons, which are flip-chip bonded to the interposer using thermo-compression bonding. The interposer itself is then flip-chip bonded to a glass and Si carrier for further testing purposes. This integration concept enables a high connection density (Gb/s/mm²) by assembling 40Gb/s per channel opto-electrical components on both sides of the interposer. Communication between components on both sides of the interposer is enabled by optical and electrical TSVs with a 3dB bandwidth >28GHz. A single mode photonic layer, designed for 1.55µm wavelength is integrated within the interposer to be used for routing and switching of the optical signals. Main fabrication and packaging steps are described here, together with some demonstrator evaluation results.
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