非互易铌酸锂硅声电延迟线

Hakhamanesh Mansoorzare, R. Abdolvand
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引用次数: 0

摘要

这项工作首次展示了利用声电(AE)效应可调插入损耗(IL)的铌酸锂硅(LNoSi)非互易声学延迟线(ADL)的实现。由于声发射效应,可以利用Si层中漂移电子与声子之间的方向和强度相关的动量交换来破坏adl的内在互易性,从而控制其频率响应。通过在其中一个adl中注入400 μ A电流,IL提高了5.2 dB,反向隔离提高了14.2 dB(即19.4 dB非倒数传输比)。这开辟了在单个小型化器件中合并长延迟、可调谐衰减器和开关的可能性,这是实现全双工微波系统的关键基石。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Non-Reciprocal Lithium Niobate-on-Silicon Acoustoelectric Delay Lines
This work demonstrates the first implementation of lithium niobate-on-silicon (LNoSi) non-reciprocal acoustic delay lines (ADL) with tunable insertion loss (IL) utilizing the acoustoelectric (AE) effect. Due to the AE effect, the direction-and the intensity-dependent momentum exchange between the drifting electrons in the Si layer and the acoustic phonons can be utilized to break the intrinsic reciprocity of the ADLs in order to control their frequency response. A 5.2 dB improvement in the IL and a 14.2 dB increase in the reverse isolation (i.e. a 19.4 dB non-reciprocal transmission ratio) is achieved through injecting a 400 µA current in one of the ADLs presented here. This opens up possibilities of merging long delays, tunable attenuators, and switches in a single miniaturized device which is a critical stepping stone in fulfillment of full-duplexed microwave systems.
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