非热等离子体苜蓿种子活力增强装置设计及处理效果研究

IF 1.2 4区 农林科学 Q3 AGRICULTURAL ENGINEERING
Yunting Hui, Yangyang Liao, Sibiao Li, Changyong Shao, Decheng Wang, Yong You
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引用次数: 0

摘要

提供了一种有效的种子处理方法。进行了三代田间生长试验。研究了低温等离子体处理对玉米生物学特性和产量组成的影响。摘要研制了常压低温介质阻挡放电(DBD)等离子体种子处理装置。该装置对紫花苜蓿种子连续工作,并在等离子体放电范围内均匀分布。处理时间、电压幅值和频率可调。利用该装置,以未处理的苜蓿种子(CK)为对照,研究了不同电压、不同时间的DBD等离子体处理对苜蓿种子萌发的影响。结果表明:DBD等离子体处理苜蓿种子能促进种子萌发和幼苗生长,最佳放电条件为放电电压为11 kV,放电时间为40 s;与对照相比,萌发势和发芽率分别提高了12.49%和18.08%。采用最佳排水时间处理后,萌发势、发芽率、干重和苗高分别比对照提高了9.9%、16.1%、15%和32.9%。经11kv和40s等离子体处理后的苜蓿种子表皮扫描电镜显示,种子表面有蚀刻现象。不同剂量的放电辐射对种子生理过程的影响不同,对等离子体放电的敏感性也不同。在一定范围内,不同放电电压和次数对苜蓿种子的发芽率、萌发势、鲜重、干重、根长、苗高均有不同程度的提高。等离子体在促进苜蓿种子生长方面具有良好的应用前景。关键词:苜蓿,介质阻挡放电等离子体,萌发,种子处理装置,幼苗生长
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design of Non-Thermal Plasma Alfalfa Seed Vigor Enhancement Device and Study of Treatment Effect
Highlights An effective seed treatment method is provided. Three generations of field growth trials were conducted. We Investigated the effects of low-temperature plasma treatment on the biological characters and yield components. Abstract. An atmospheric pressure, low-temperature dielectric barrier discharge (DBD) plasma seed treatment device was developed for plasma seed treatment. The device worked continuously on alfalfa seeds and evenly distributed the seeds in a plasma discharge range. The processing time, voltage amplitude, and frequency were adjustable. The device was used to study the effect of DBD plasma treatment at different voltages and times on alfalfa seed germination using untreated alfalfa seeds as the control (CK). The results showed that the DBD plasma treatment of alfalfa seeds promoted seed germination and seedling growth, and the optimal discharge conditions were a discharge voltage of 11 kV and a discharge time of 40 s. Compared with CK, the germination potential and germination rate increased by 12.49% and 18.08%, respectively. After treatment using the optimal discharge time, the germination potential, germination rate, dry weight, and seedling height increased by 9.9%, 16.1%, 15%, and 32.9%, respectively, compared with CK. The Scanning Electron Microscope images of the seed epidermis treated with 11 kV and 40 s plasma showed that the surface of alfalfa seeds was etched. Different doses of discharge radiation had different effects on physiological processes in seeds, and their sensitivity to plasma discharge was different. In a certain range, the germination rate, germination potential, fresh weight, dry weight, root length, and seedling height of alfalfa seeds improved to different degrees under different discharge voltages and times. Plasma has a good application prospect for improving the growth of alfalfa seeds. Keywords: Alfalfa, Dielectric barrier discharge plasma, Germination, Seed treatment device, Seedling growth.
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