如何提高硅纳米晶存储电池在低功耗应用中的性能

V. D. Marca, J. Amouroux, G. Molas, J. Postel-Pellerin, F. Lalande, Philippe Boivin, E. Jalaguier, B. D. Salvo, J. Ogier
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引用次数: 2

摘要

在本文中,我们提出优化1T硅纳米晶(Si-nc)存储单元,以降低低功耗应用的能耗。对优化通道热电子注入(达到4.5V编程窗口,消耗1nJ)和Fowler-Nordheim编程进行了分析和比较。调整隧道氧化物厚度、Si-ncs覆盖面积和SiN硅纳米晶体封盖层以优化数据保留和持久标准。我们首次提出了Si-nc电池长达106次循环的续航特性,最终编程窗口为4V。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
How to improve the silicon nanocrystal memory cell performances for low power applications
In this paper we propose to optimize the 1T silicon nanocrystal (Si-nc) memory cell in order to reduce the energy consumption for low power applications. Optimized Channel Hot Electron Injection (a 4.5V programming window is reached consuming 1nJ) and Fowler-Nordheim programming are analyzed and compared. The tunnel oxide thickness, Si-ncs area coverage and SiN silicon nanocrystals capping layer are adjusted to optimize the data retention and endurance criteria. We present for the first time the endurance characteristics of a Si-nc cell up to 106 cycles with a final programming window of 4V.
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