温度对硒薄膜电性能的影响

Sunil Thomas, N. Qamhieh, S. Mahmoud
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引用次数: 2

摘要

本研究采用热蒸发法制备了厚度为~ 2.1µm的硒薄膜。利用能量色散谱法证实了样品中硒的存在。利用拉曼光谱对退火前后样品中的结构基团进行了振动分析。利用x射线衍射研究了样品的退火结晶。利用吸收光谱的乌尔巴赫边估计了退火后薄膜带隙的变化。研究了不同电压下的电导率和电容等电性能。研究了样品从室温加热到400k时电导和电容的变化。本研究采用热蒸发法制备了厚度为~ 2.1µm的硒薄膜。利用能量色散谱法证实了样品中硒的存在。利用拉曼光谱对退火前后样品中的结构基团进行了振动分析。利用x射线衍射研究了样品的退火结晶。利用吸收光谱的乌尔巴赫边估计了退火后薄膜带隙的变化。研究了不同电压下的电导率和电容等电性能。研究了样品从室温加热到400k时电导和电容的变化。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Influence of temperature on the electrical properties of selenium thin films
In the present study, selenium thin films of thickness ∼2.1 µm were synthesized using thermal evaporation method. The presence of selenium in the sample was confirmed using energy dispersive spectrum. Vibration analysis of the structural groups in the samples, before and after annealing, was carried out using Raman spectroscopy. The crystallization of the sample due to annealing was studied using X-ray diffraction. The change in the energy band gap of the film due to annealing was estimated from the Urbach edge of the absorption spectrum. Electrical properties namely conductance and capacitance at different voltages were investigated. Changes in the conductance and capacitance when heating the sample from room temperature to 400 K were studied.In the present study, selenium thin films of thickness ∼2.1 µm were synthesized using thermal evaporation method. The presence of selenium in the sample was confirmed using energy dispersive spectrum. Vibration analysis of the structural groups in the samples, before and after annealing, was carried out using Raman spectroscopy. The crystallization of the sample due to annealing was studied using X-ray diffraction. The change in the energy band gap of the film due to annealing was estimated from the Urbach edge of the absorption spectrum. Electrical properties namely conductance and capacitance at different voltages were investigated. Changes in the conductance and capacitance when heating the sample from room temperature to 400 K were studied.
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