{"title":"技术压力及其与工作环境中精神负荷的关系","authors":"J.M. Castillo, E. Galy, P. Thérouanne","doi":"10.1016/j.pto.2023.06.001","DOIUrl":null,"url":null,"abstract":"<div><p>The study of Technostress (stress caused using technology) and mental workload has increased after the introduction and massive use of digital technologies in a professional context. Although there is now a vast literature on the two concepts, few works have addressed the two phenomena together. This research article focuses on the bibliographic review of the two concepts and presents the differences and similarities that exist between the two phenomena in the professional context. Finally, a research model is presented that proposes a relationship between Technostress and mental workload.</p></div>","PeriodicalId":43191,"journal":{"name":"Psychologie du Travail et des Organisations","volume":"29 4","pages":"Pages 197-213"},"PeriodicalIF":0.3000,"publicationDate":"2023-07-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Le Technostress et sa relation avec la charge mentale en contexte professionnel\",\"authors\":\"J.M. Castillo, E. Galy, P. Thérouanne\",\"doi\":\"10.1016/j.pto.2023.06.001\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>The study of Technostress (stress caused using technology) and mental workload has increased after the introduction and massive use of digital technologies in a professional context. Although there is now a vast literature on the two concepts, few works have addressed the two phenomena together. This research article focuses on the bibliographic review of the two concepts and presents the differences and similarities that exist between the two phenomena in the professional context. Finally, a research model is presented that proposes a relationship between Technostress and mental workload.</p></div>\",\"PeriodicalId\":43191,\"journal\":{\"name\":\"Psychologie du Travail et des Organisations\",\"volume\":\"29 4\",\"pages\":\"Pages 197-213\"},\"PeriodicalIF\":0.3000,\"publicationDate\":\"2023-07-15\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Psychologie du Travail et des Organisations\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S1420253023000468\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"PSYCHOLOGY, APPLIED\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Psychologie du Travail et des Organisations","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1420253023000468","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PSYCHOLOGY, APPLIED","Score":null,"Total":0}
Le Technostress et sa relation avec la charge mentale en contexte professionnel
The study of Technostress (stress caused using technology) and mental workload has increased after the introduction and massive use of digital technologies in a professional context. Although there is now a vast literature on the two concepts, few works have addressed the two phenomena together. This research article focuses on the bibliographic review of the two concepts and presents the differences and similarities that exist between the two phenomena in the professional context. Finally, a research model is presented that proposes a relationship between Technostress and mental workload.