热激光蒸发生长外延膜

Dong Yeong Kim, J. Mannhart, W. Braun
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引用次数: 2

摘要

我们用热激光蒸发法证明了薄膜的外延生长。在激光加热的氧化物衬底上,通过激光蒸发Ni、V和Ru元素源,在不同的氧-臭氧气氛下生长外延金属氧化物薄膜。这导致在Al2O3(0001)或MgO(100)衬底上形成NiO (111), VO2 (M1)(020)和RuO2(110)外延薄膜。通过面内和面外x射线测量证实,薄膜与衬底具有明确的晶体取向关系。结果揭示了热激光外延在超高纯度氧化异质结构外延生长中的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Epitaxial film growth by thermal laser evaporation
We demonstrate the epitaxial growth of thin films by thermal laser evaporation. Epitaxial metal oxide films are grown by laser evaporating Ni, V, and Ru elemental sources in a variety of oxygen-ozone atmospheres on laser-heated oxide substrates. This results in NiO (111), VO2 (M1) (020), and RuO2 (110) epitaxial films on Al2O3 (0001) or MgO (100) substrates. The films show well-defined crystallographic orientation relationships with the substrates, as confirmed by in-plane and out-of-plane x-ray measurements. The results reveal the potential of thermal laser epitaxy for the epitaxial growth of ultrahigh-purity oxide heterostructures.
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