高纵横比氮化硅纳米膜的杨氏模量

Ping-Hei Chen, Cheng-Hao Yang, Chien-Ying Tsai, Tien-Li Chang, W. Hsu, Tai-Chou Chen
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引用次数: 2

摘要

纳米膜的物理性质与块状材料不同。然而,由于纳米厚度薄膜的纳米尺度,需要一种新的方法来测量其物理性质。目前,由于纳米结构的力学性能尚未确定,许多潜在的应用并不实际。本研究采用硅微加工技术制备了悬浮式高纵横比氮化硅纳米厚膜。膜的厚度为30nm,面积为4mm × 7mm,如图1所示。氮化硅纳米厚度膜的杨氏模量是由膜自身重量引起的悬浮膜的挠度决定的。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Young's Modulus of High Aspect Ratio Si3N4 Nano-thickness Membrane
The physical properties of nano-thickness membrane are known to be different from those of bulk material. However, it requires a novel approach to measure the physical properties of nano-thickness membrane due to its nano-scale dimension. Currently, many potential applications for the nanoscale structures are not really practical because their mechanical properties have not been established. In this study, a suspended high aspect ratio silicon nitride nano-thickness membrane is fabricated by using silicon micro-machining. The membrane has a thickness of 30 nm and an area of 4 mm by 7 mm, as shown in Fig.1. Young's modulus of the silicon nitride nano-thickness membrane is determined from the deflection of the suspended membrane, which is resulted from the weight of membrane itself.
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