Photoluminescence from Ordered Ge/Si Quantum Dot Groups Grown on the Strain‐Patterned Substrates

The photoluminescence (PL) properties of combined Ge/Si structures representing a combination of large (200–250 nm) SiGe disk-like quantum dots (QDs) and the groups of smaller (40–50 nm) laterally ordered QDs grown on the nanodisk surface are studied. The experimental results are analyzed basing on the calculations of energy spectra, electron and hole wave functions. It is found that the strain accumulation in multi-layered structure is the main factor providing the room temperature PL. The new type of QD structures that should provide the observation of enhanced PL from SiGe QDs at room temperature is proposed. The structures represent the stacked compact groups of laterally aligned QDs incorporated in Si at the distance 30–40 nm above the large nanodisks.