20µm间距的超高片对片互连密度的新型扇出概念

A. Podpod, J. Slabbekoorn, A. Phommahaxay, F. Duval, A. Salahouelhadj, Mario Gonzalez, K. Rebibis, Andy Miller, G. Beyer, E. Beyne
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引用次数: 28

摘要

用于下一代设备节点的逻辑和存储芯片之间所需的数据带宽的快速增长正在逐步将低I/O计数串行总线推向其极限。为了进一步满足对高数据速率日益增长的需求,现在正在开发和建立更宽的I/O计数总线。在过去的几年里,各种扇出晶圆级封装(FOWLP)方法已经被开发出来,以满足上述需求和封装上越来越高的功能集成要求。Imec一直致力于一种新颖的300mm扇出晶圆级封装概念,可实现20 μ m间距的互连密度。实验结果表明,在硅衬底上成型后,晶圆弯曲小于500µm,超低模移,在全300mm晶圆上最大模与载流子失配小于10µm。根据晶圆必须经过的工艺步骤,预计会有进一步的翘曲和模移演变,并将进一步讨论。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Novel Fan-Out Concept for Ultra-High Chip-to-Chip Interconnect Density with 20-µm Pitch
The rapid growth of data bandwidth required between logic and memory chips for next generation device nodes is progressively pushing low I/O count serial busses to their limits. To further satisfy this increasing need for high data rates, wider I/O count busses are now being developed and established. Over the past years, various Fan-Out Wafer-Level-Packaging (FOWLP) approaches have been developed to answer the needs mentioned above and the increasingly demanding function integration on package. Imec has been working on a novel 300mm Fan-Out Wafer-Level-Packaging concept that enables 20µm pitch interconnect density. Results from experiments demonstrates wafer bow below 500µm after molding on silicon substrate with ultra-low die shift with maximum die to carrier mismatch below 10µm on full 300mm wafers. Further warpage and die shift evolution are expected depending on the process steps the wafers must go through and will be further discussed.
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