薄膜厚度对光伏热蒸发制备硒化锡薄膜光学性能的影响

N. Kumar, U. Parihar, Rakesh Kumar, Keyur J. Patel, C. Panchal, N. Padha
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引用次数: 68

摘要

采用热蒸发法制备了硒化锡(SnSe)薄膜,研究了薄膜厚度对其结构和光学性能的影响。在室温下,在玻璃衬底上生长不同厚度的SnSe薄膜,厚度从150 nm到500 nm不等。采用x射线衍射、原子力显微镜、透射率测量和四点探针法对薄膜进行了表征。透射光谱表明,能带隙随膜厚的增加而减小。电阻率分析表明,薄膜具有半导体性质,具有p型导电性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of Film Thickness on Optical Properties of Tin Selenide Thin Films Prepared by Thermal Evaporation for Photovoltaic Applications
Tin Selenide (SnSe) thin films were prepared from the pulverized compound material by thermal evaporation method, to study the effect of film thickness on its structural, and optical properties. The different thicknesses of SnSe thin films, from 150 nm to 500 nm, were grown on glass substrate held at room temperature. X-ray diffraction, atomic force microscopy, transmission measurement, and four-point probe method were used to characterize the thin films. The optical transmission spectra suggests, the energy band gap decreases with increasing the film thickness. The electrical resistivity shows that the films were semi-conducting in behavior having p-type conductivity.
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