D. Kondo, H. Nakano, Bo Zhou, I. Kubota, Kenjiro Hayashi, K. Yagi, M. Takahashi, Motonobu Sato, Shintaro Sato, N. Yokoyama
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Intercalated multi-layer graphene grown by CVD for LSI interconnects
We have fabricated multi-layer graphene (MLG) wiring and demonstrated a resistivity of the same order as Cu and reliability better than Cu. The MLG was synthesized epitaxially by chemical vapor deposition (CVD) on an epitaxial Co film, resulting in quality and electrical properties as good as those of a graphite crystal. The MLG was further intercalated with FeCl3 to achieve a resistivity as low as 9.1 μΩ cm. Our results show that intercalated MLG is really promising for future LSI interconnects.
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