背面吸收层显微镜:单层计数在二维晶体片

D. Ausserré, Refahi Abou Khachfe, T. Taniguchi, Kenji Watanabe, F. Vialla
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引用次数: 0

摘要

二维(2D)材料堆叠的性质严重依赖于堆叠中的单层数(m)。因此,量化这个数字是很重要的,这是一个局部数量,因为二维堆栈本质上是异质的。基于对比度增强表面的光学干涉技术可能足够敏感,可以可视化m的变化,但m的实验测定需要与多参数数值模型进行大量且不稳定的比较。聚焦于最近的背面吸收层显微镜,这是迄今为止干涉技术中最敏感的,展示了一种自校准方法,允许在整个样品表面瞬时进行单层计数,而不需要了解仪器参数、样品或环境折射率或对比度增强层的详细结构。以六方氮化硼(hBN)堆叠为例,逐步介绍了该方法。使用基本图像分析获得了精确的单层计数,最多可达36个hBN单层。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Backside Absorbing Layer Microscopy: Monolayer Counting in 2D Crystal Flakes
The properties of two‐dimensional (2D) material stacks critically depend on the number of monolayers (m) in the stack. It is therefore important to quantify this number, which is a local quantity since 2D stacks are essentially heterogeneous. Optical interferential techniques based on contrast‐enhancing surfaces may be sensitive enough to visualize m variations but the experimental determination of m requires heavy and unstable comparisons with multiparameter numerical models. Focusing on the recent backside absorbing layer microscopy, the most sensitive to date among interferential techniques, a self‐calibrating method is demonstrated allowing instantaneous monolayer counting all over the sample surface which does not require the knowledge of the instrumental parameters, the sample or ambient refractive indices or the detailed structure of the contrast‐enhancing layer. This method is introduced step by step using examples of hexagonal boron nitride (hBN) stacks with increasing complexity. Exact monolayer counting up to 36 hBN monolayers is obtained using basic image analysis.
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