紫外线曝光:一种制造纳米线太阳能电池的新工艺

2019 IEEE 46th Photovoltaic Specialists Conference (PVSC) Pub Date : 2019-06-01 DOI:10.1109/PVSC40753.2019.8980764

Yuwei Zhang, Yang Chen, L. Hrachowina, C. Sundvall, I. Åberg, M. Borgström

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引用次数: 2

摘要

我们展示了一种新的、快速的纳米线(NW)太阳能电池加工方法。将NW阵列嵌入光刻胶中。NWs对光的强吸收导致抗蚀剂的自我限制曝光，这使得选择性去除抗蚀剂的暴露部分，为NWs的尖端和进一步加工打开了空间。与传统的反应性离子蚀刻方法相比，紫外线曝光技术可以实现快速和低成本的过程。

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UV exposure: a novel processing method to fabricate nanowire solar cells

We demonstrate a novel and rapid method for nanowire (NW) solar cell processing. NW arrays were embedded in photoresist. The strong absorption of light in the NWs leads to self-limited exposure of the resist, which enables selective removal of the exposed part of the resist, opening up for the tips of the NWs and further processing. The UV-exposure technology allows a fast and low-cost process compared to the conventional reactive ion etching method.

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2019 IEEE 46th Photovoltaic Specialists Conference (PVSC)

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