支持tcad的机器学习缺陷预测加速先进半导体器件故障分析

C. Teo, Kain Lu Low, V. Narang, A. Thean
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引用次数: 31

摘要

在这项工作中,我们提出了一种结合TCAD建模和机器学习的独特方法来检测单鳍FinFET中桥接缺陷的缺陷位置。缺陷位置的预测由随机森林算法组成的预测模型指导,该模型由可测量的电属性训练而成。该方法对缺陷位置的预测精度较高,进一步提高了缺陷分析的成功率,加快了从设计到产品的周期。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
TCAD-Enabled Machine Learning Defect Prediction to Accelerate Advanced Semiconductor Device Failure Analysis
In this work, we present a unique approach of combining TCAD modelling and machine learning to detect the defect locations of a bridging defect in a single-fin FinFET. The prediction of the defect location is guided by the predictive model consisting of Random Forest algorithm which is trained with the measureable electrical attributes from the I-V. High accuracy in predicting the defect location is achieved by the proposed scheme which can further enhance the FA success rate, expediting the cycle of design to product.
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