瑞利还是阿贝?微光刻解析度公式的起源及命名

IF 1.5 2区物理与天体物理 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC

Journal of Micro/Nanolithography, MEMS, and MOEMS Pub Date : 2020-11-06 DOI:10.1117/1.jmm.19.4.040501

A. Yen

{"title":"瑞利还是阿贝?微光刻解析度公式的起源及命名","authors":"A. Yen","doi":"10.1117/1.jmm.19.4.040501","DOIUrl":null,"url":null,"abstract":"We review the history in connection with the resolution formula of microlithography and argue that it was Abbe rather than Rayleigh who definitively stated the 0.5λNA resolution limit for the minimum pitch first, using an approach more relevant to projection imaging, and hence, this expression should be more appropriately referred to as the Abbe formula for the resolution of a projection imaging system.","PeriodicalId":16522,"journal":{"name":"Journal of Micro/Nanolithography, MEMS, and MOEMS","volume":"1 1","pages":""},"PeriodicalIF":1.5000,"publicationDate":"2020-11-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"8","resultStr":"{\"title\":\"Rayleigh or Abbe? Origin and naming of the resolution formula of microlithography\",\"authors\":\"A. Yen\",\"doi\":\"10.1117/1.jmm.19.4.040501\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We review the history in connection with the resolution formula of microlithography and argue that it was Abbe rather than Rayleigh who definitively stated the 0.5λNA resolution limit for the minimum pitch first, using an approach more relevant to projection imaging, and hence, this expression should be more appropriately referred to as the Abbe formula for the resolution of a projection imaging system.\",\"PeriodicalId\":16522,\"journal\":{\"name\":\"Journal of Micro/Nanolithography, MEMS, and MOEMS\",\"volume\":\"1 1\",\"pages\":\"\"},\"PeriodicalIF\":1.5000,\"publicationDate\":\"2020-11-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"8\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Micro/Nanolithography, MEMS, and MOEMS\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1117/1.jmm.19.4.040501\",\"RegionNum\":2,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q3\",\"JCRName\":\"ENGINEERING, ELECTRICAL & ELECTRONIC\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Micro/Nanolithography, MEMS, and MOEMS","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1117/1.jmm.19.4.040501","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}

引用次数: 8

摘要

我们回顾了与微光刻分辨率公式相关的历史，并认为是阿贝而不是瑞利首先明确地提出了最小间距0.5λNA的分辨率限制，使用了与投影成像更相关的方法，因此，这个表达式应该更合适地称为投影成像系统分辨率的阿贝公式。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

查看原文本刊更多论文

Rayleigh or Abbe? Origin and naming of the resolution formula of microlithography

We review the history in connection with the resolution formula of microlithography and argue that it was Abbe rather than Rayleigh who definitively stated the 0.5λNA resolution limit for the minimum pitch first, using an approach more relevant to projection imaging, and hence, this expression should be more appropriately referred to as the Abbe formula for the resolution of a projection imaging system.

求助全文

通过发布文献求助，成功后即可免费获取论文全文。去求助

来源期刊

Journal of Micro/Nanolithography, MEMS, and MOEMS Multiple-

CiteScore

3.40

自引率

30.40%

发文量

审稿时长

6-12 weeks