瑞利还是阿贝?微光刻解析度公式的起源及命名

IF 1.5 2区物理与天体物理 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC

Journal of Micro/Nanolithography, MEMS, and MOEMS Pub Date : 2020-11-06 DOI:10.1117/1.jmm.19.4.040501

A. Yen

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引用次数: 8

摘要

我们回顾了与微光刻分辨率公式相关的历史，并认为是阿贝而不是瑞利首先明确地提出了最小间距0.5λNA的分辨率限制，使用了与投影成像更相关的方法，因此，这个表达式应该更合适地称为投影成像系统分辨率的阿贝公式。

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Rayleigh or Abbe? Origin and naming of the resolution formula of microlithography

We review the history in connection with the resolution formula of microlithography and argue that it was Abbe rather than Rayleigh who definitively stated the 0.5λNA resolution limit for the minimum pitch first, using an approach more relevant to projection imaging, and hence, this expression should be more appropriately referred to as the Abbe formula for the resolution of a projection imaging system.

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来源期刊

Journal of Micro/Nanolithography, MEMS, and MOEMS Multiple-

CiteScore

3.40

自引率

30.40%

发文量

审稿时长

6-12 weeks