硅衬底和多孔硅衬底混合III-V/SiGe太阳能电池

P. Caño, M. Hinojosa, L. Cifuentes, H. Nguyen, A. Morgan, D. F. Marrón, I. García, Andrew J. Johnson, I. Rey‐Stolle
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引用次数: 3

摘要

在具有亚表面多孔层的硅衬底上生长了iv族反向缓冲层,开发了一种串联GaAsP/SiGe太阳能电池。反向缓冲层有助于在有限厚度下减少螺纹位错密度,但缓解了裂纹的出现,正如在常规Si衬底上生长的先前设计中所观察到的那样。在这种新设计中,多孔硅层已被纳入接近衬底表面。这一层的延展性有助于抑制裂纹的扩展,减少低分流电阻的问题,从而提高太阳能电池的性能。这里给出了这种新体系结构的第一个结果。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Hybrid III-V/SiGe solar cells on Si substrates and porous Si substrates
A tandem GaAsP/SiGe solar cell has been developed employing group-IV reverse buffer layers grown on silicon substrates with a subsurface porous layer. Reverse buffer layers facilitate a reduction in the threading dislocation density with limited thicknesses, but ease the appearance of cracks, as observed in previous designs grown on regular Si substrates. In this new design, a porous silicon layer has been incorporated close to the substrate surface. The ductility of this layer helps repress the propagation of cracks, diminishing the problems of low shunt resistance and thus improving solar cell performance. The first results of this new architecture are presented here.
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