硅集成注入逻辑工作在350摄氏度以上

T. Sunayama, H. Kawakami, M. Migitaka
{"title":"硅集成注入逻辑工作在350摄氏度以上","authors":"T. Sunayama, H. Kawakami, M. Migitaka","doi":"10.1109/IEDM.1991.235476","DOIUrl":null,"url":null,"abstract":"In order to develop silicon ICs operating above 350 degrees C, an integrated injection logic (IlL) was chosen as an example. A novel structure for the IIL was designed through experimental and theoretical studies of pn junctions and transistors at high temperatures. The designed IIL was achieved by newly developed combined processes of ion implantation and low-temperature epitaxy. The developed IIL is fully operational from room temperature to 385 degrees C. The V/sub OH/ decreases with temperature at the rate of 1.8 mV/ degrees C and is about 215 mV at 370 degrees C. V/sub OL/ does the same at about 45 mV in a temperature range from 50 to 370 degrees C. The signal swing of a nine-stage ring oscillator is about 30 mV at 385 degrees C. The power delay product is 18 pJ/stage.<<ETX>>","PeriodicalId":13885,"journal":{"name":"International Electron Devices Meeting 1991 [Technical Digest]","volume":"86 1","pages":"161-164"},"PeriodicalIF":0.0000,"publicationDate":"1991-12-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Silicon integrated injection logic operating above 350 degrees C\",\"authors\":\"T. Sunayama, H. Kawakami, M. Migitaka\",\"doi\":\"10.1109/IEDM.1991.235476\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In order to develop silicon ICs operating above 350 degrees C, an integrated injection logic (IlL) was chosen as an example. A novel structure for the IIL was designed through experimental and theoretical studies of pn junctions and transistors at high temperatures. The designed IIL was achieved by newly developed combined processes of ion implantation and low-temperature epitaxy. The developed IIL is fully operational from room temperature to 385 degrees C. The V/sub OH/ decreases with temperature at the rate of 1.8 mV/ degrees C and is about 215 mV at 370 degrees C. V/sub OL/ does the same at about 45 mV in a temperature range from 50 to 370 degrees C. The signal swing of a nine-stage ring oscillator is about 30 mV at 385 degrees C. The power delay product is 18 pJ/stage.<<ETX>>\",\"PeriodicalId\":13885,\"journal\":{\"name\":\"International Electron Devices Meeting 1991 [Technical Digest]\",\"volume\":\"86 1\",\"pages\":\"161-164\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1991-12-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Electron Devices Meeting 1991 [Technical Digest]\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEDM.1991.235476\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Electron Devices Meeting 1991 [Technical Digest]","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.1991.235476","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

为了开发工作在350℃以上的硅集成电路,选择了集成注入逻辑(IlL)作为示例。通过对高温下pn结和晶体管的实验和理论研究,设计了一种新型的IIL结构。采用新开发的离子注入与低温外延相结合的工艺实现了所设计的IIL。所开发的IIL在室温至385℃范围内完全工作,V/sub OH/以1.8 mV/℃的速率降低,在370℃时约为215 mV,在50 ~ 370℃温度范围内,V/sub OL/以45 mV的速率降低,9级环形振荡器在385℃时的信号摆幅约为30 mV,功率延迟乘积为18 pJ/级
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Silicon integrated injection logic operating above 350 degrees C
In order to develop silicon ICs operating above 350 degrees C, an integrated injection logic (IlL) was chosen as an example. A novel structure for the IIL was designed through experimental and theoretical studies of pn junctions and transistors at high temperatures. The designed IIL was achieved by newly developed combined processes of ion implantation and low-temperature epitaxy. The developed IIL is fully operational from room temperature to 385 degrees C. The V/sub OH/ decreases with temperature at the rate of 1.8 mV/ degrees C and is about 215 mV at 370 degrees C. V/sub OL/ does the same at about 45 mV in a temperature range from 50 to 370 degrees C. The signal swing of a nine-stage ring oscillator is about 30 mV at 385 degrees C. The power delay product is 18 pJ/stage.<>
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信