嵌入纳米锗的SiO2薄膜中的输运机制

C. Palade, A. Lepadatu, I. Stavarache, A. Maraloiu, V. Teodorescu, M. Ciurea
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引用次数: 0

摘要

本文报道了嵌入纳米锗的非晶SiO2薄膜的导电机理。为此,采用了电流-温度和电流-电压测量,并将其与透射电子显微镜(TEM)获得的微观结构结果相关联。透射电镜图像显示,薄膜中含有低密度的大的锗纳米粒子和高密度的小的锗纳米粒子,后者是唯一负责电输运的纳米粒子。在低温和高温下分别发现了两种输运机制,即在费米能级附近的能带上跃迁局域态和在迁移率边缘的电荷激发到扩展态。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Transport mechanisms in SiO2 films with embedded Germanium nanoparticles
This paper reports on the conduction mechanisms in amorphous SiO2 films with embedded Ge nanoparticles. For this, measurements of current-temperature and current-voltage were employed and correlated with the microstructure results obtained from transmission electron microscopy (TEM). TEM images reveal that our films contain big Ge nanoparticles with low density and small Ge nanoparticles with high density, the last ones being the only responsible for the electrical transport. Two transport mechanisms were found at low and high temperature respectively, namely hopping on localized states in a band near Fermi level and charge excitation to the extended states at mobility edge.
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