Cu-Ni-P合金化学镀统计模型建立系统的研究

M. Georgieva
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引用次数: 1

摘要

化学镀是最方便的电介质金属化方法。在这一过程的统计研究中,发现了电解质组成和沉积制度之间的复杂关系。该技术的复杂性是一个重要的多因素研究对象。通过计划析因试验,建立了Cu-Ni-P合金镀层化学沉积的线性回归模型。它可以根据所研究因子空间中的输入参数(硫酸铜、硫酸镍和次亚磷酸钠的浓度)的某些值预测化学沉积合金涂层的厚度,并进一步优化工艺。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Study of a system for creating a statistical model of the electroless plating of Cu-Ni-P alloys
ABSTRACT The electroless plating method is the most convenient for the metallisation of dielectrics. During this statistical study of the process, complex relationships were found between the composition of the electrolyte and the deposition regime. The complexity of this technology is an important multifactorial object of the study. An adequate linear regression model for electroless deposition of Cu-Ni-P alloy coatings was obtained by conducting a planned factorial experiment. It allows predicting the thickness of the electroless deposited alloy coating based on certain values of the input parameters (concentrations of copper sulphate, nickel sulphate and sodium hypophosphite) in the studied factor space, as well as further optimisation of the process.
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