等离子体夹紧强度、电流鞘层对称性与APF等离子体聚焦装置HXR产率的相关性

R. Amrollahi, M. Habibi, S. Shahshenas
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引用次数: 2

摘要

在Amirkabir等离子体聚焦(APF)装置(16 kV, 36 μ f, 115 nH)中,利用磁探针研究了电流鞘层对称性对压缩等离子体强度的影响。同时记录电流护套到达探针的时间、硬x射线(HXR)信号和放电电流信号。仿真结果与实验结果进行了比较。电流鞘层对称性、压缩等离子体强度和HXR产率之间似乎有很好的一致性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Correlation between plasma pinch intensity, current sheath symmetry, and HXR yield by APF plasma focus device
In this paper, we study the effect of current sheath symmetry on pinched plasma intensity in Amirkabir Plasma Focus (APF) facility (16 kV, 36 μ f and 115 nH) by the magnetic probes. The arrival times of current sheath reaching to the probes, the signals of hard X-ray (HXR) and also discharge current signal are recorded simultaneously. The simulated trajectory, velocity and intensity of current sheath are compared with the experimental results. There seems to be a good accordance among current sheath symmetry, pinched plasma intensity and HXR yield.
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来源期刊
Plasma Devices and Operations
Plasma Devices and Operations 物理-核科学技术
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