Liyang Zhu, Qi Zhou, Kuangli Chen, Xiu Yang, Jiacheng Lei, Zhihua Luo, Chunhua Zhou, K. J. Chen, Bo Zhang
{"title":"一种新型超薄势垒AlGaN/GaN错门控杂化阳极二极管,具有改进的高温反向阻滞特性","authors":"Liyang Zhu, Qi Zhou, Kuangli Chen, Xiu Yang, Jiacheng Lei, Zhihua Luo, Chunhua Zhou, K. J. Chen, Bo Zhang","doi":"10.1109/ICSICT49897.2020.9278128","DOIUrl":null,"url":null,"abstract":"In this work, a novel MIS-gated hybrid anode diode (MG-HAD) based on ultra-thin-barrier (UTB) AlGaN/GaN heterostructure is demonstrated to exhibit a superior reverse blocking characteristic. An ultra-low reverse leakage of ~1.1 × 10−7 A/mm observed in room-temperature (RT) and the breakdown voltage (BV) dominated by buffer breakdown, verify the excellent reverse blocking characteristic originated from the ALD-Ah03 insulator in MIS-gate structure. More importantly, the reverse leakage current maintains respectably low at high temperature (HT) up to 200 °C, which is as low as ~5.1 × 10−7 A/mm at 200 °C and is among the best reported results at the comparable reverse bias voltage and temperature.. Such a great superiority in HT reverse blocking capability indicates that the UTB MG-HAD is a promising device structure and technology for high performance GaN power diodes.","PeriodicalId":6727,"journal":{"name":"2020 IEEE 15th International Conference on Solid-State & Integrated Circuit Technology (ICSICT)","volume":"26 1","pages":"1-3"},"PeriodicalIF":0.0000,"publicationDate":"2020-11-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"A Novel Ultra-thin-barrier AlGaN/GaN MIS-gated Hybrid Anode Diode Featuring Improved High-temperature Reverse Blocking Characteristic\",\"authors\":\"Liyang Zhu, Qi Zhou, Kuangli Chen, Xiu Yang, Jiacheng Lei, Zhihua Luo, Chunhua Zhou, K. J. Chen, Bo Zhang\",\"doi\":\"10.1109/ICSICT49897.2020.9278128\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work, a novel MIS-gated hybrid anode diode (MG-HAD) based on ultra-thin-barrier (UTB) AlGaN/GaN heterostructure is demonstrated to exhibit a superior reverse blocking characteristic. An ultra-low reverse leakage of ~1.1 × 10−7 A/mm observed in room-temperature (RT) and the breakdown voltage (BV) dominated by buffer breakdown, verify the excellent reverse blocking characteristic originated from the ALD-Ah03 insulator in MIS-gate structure. More importantly, the reverse leakage current maintains respectably low at high temperature (HT) up to 200 °C, which is as low as ~5.1 × 10−7 A/mm at 200 °C and is among the best reported results at the comparable reverse bias voltage and temperature.. Such a great superiority in HT reverse blocking capability indicates that the UTB MG-HAD is a promising device structure and technology for high performance GaN power diodes.\",\"PeriodicalId\":6727,\"journal\":{\"name\":\"2020 IEEE 15th International Conference on Solid-State & Integrated Circuit Technology (ICSICT)\",\"volume\":\"26 1\",\"pages\":\"1-3\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2020-11-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2020 IEEE 15th International Conference on Solid-State & Integrated Circuit Technology (ICSICT)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICSICT49897.2020.9278128\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2020 IEEE 15th International Conference on Solid-State & Integrated Circuit Technology (ICSICT)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICSICT49897.2020.9278128","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
In this work, a novel MIS-gated hybrid anode diode (MG-HAD) based on ultra-thin-barrier (UTB) AlGaN/GaN heterostructure is demonstrated to exhibit a superior reverse blocking characteristic. An ultra-low reverse leakage of ~1.1 × 10−7 A/mm observed in room-temperature (RT) and the breakdown voltage (BV) dominated by buffer breakdown, verify the excellent reverse blocking characteristic originated from the ALD-Ah03 insulator in MIS-gate structure. More importantly, the reverse leakage current maintains respectably low at high temperature (HT) up to 200 °C, which is as low as ~5.1 × 10−7 A/mm at 200 °C and is among the best reported results at the comparable reverse bias voltage and temperature.. Such a great superiority in HT reverse blocking capability indicates that the UTB MG-HAD is a promising device structure and technology for high performance GaN power diodes.