卡普顿和热酰亚胺径迹探测器的体刻蚀行为

S.K. Chakarvarti, S.K. Mahna
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引用次数: 5

摘要

聚酰亚胺和聚醚酰亚胺最近被认为是具有独特性能的材料,对于生产更高效和有用的核轨道过滤器至关重要。我们在此报道了Kapton-H(聚酰亚胺)和Thermalimide箔在不同温度、环境光和黑暗条件下,使用蚀刻剂NaOCl(4%Clw/v)和NaOCl+乙醇(1:1),在搅拌和不搅拌的情况下的整体蚀刻特性。还报道了蚀刻的活化能值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Bulk-etching behaviour of Kapton and Thermalimide track detectors

Polyimides and polyetherimides have recently been recognized as materials with unique properties which are essential for the production of more efficient and useful nuclear track filters. We report here the bulk-etch characteristics of Kapton-H (polyimide) and Thermalimide foils using etchants NaOCl (4% Cl w/v) and NaOCl + ethanol (1:1) at different temperatures and under ambient light and dark conditions, with and without stirring. The activation energy values for etching are also reported.

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