{"title":"甲基丙烯酰丙氨酸甲酯共聚对CR-39中径迹蚀刻的增感作用","authors":"Masao Tamada, Masaru Yoshida, Masaharu Asano, Hideki Omichi, Ryoichi Katakal, Christine Trautmann, Johann Vetter, Reimar Shohr","doi":"10.1016/1359-0189(92)90002-D","DOIUrl":null,"url":null,"abstract":"<div><p>Copolymer films of diethyleneglycol-bis-allylcarbonate (monomer of CR-39) and selected volume percentages of methacryloyl-<span>L</span>-alanine methyl ester (MA-<span>L</span>-AlaOMe) between 5 and 60% were irradiated with Au ions of 13 MeV nucl<sup>-1</sup> and etched in NaOH solution at 60°C. Sensitization of track etching was observed for NaOH concentrations of 4 and 6 N. The maximum reduced etch-rate ratio, <em>V</em><sub>t</sub>/<em>V</em><sub>b</sub>-1, was obtained for the copolymer of 90% of CR-39 monomer and 10% of MA-<span>L</span>-AlaOMe at 4 N NaOH, which was 3.6 times higher than that for pure CR-39. The sensitization was accompanied by an increase in <em>V</em><sub>b</sub> so that the etching time could be reduced to <em>ca</em> 1/30 in comparison with that for pure CR-39.</p></div>","PeriodicalId":81549,"journal":{"name":"International Journal Of Radiation Applications And Instrumentation. Part D, Nuclear Tracks And Radiation Measurements","volume":"20 4","pages":"Pages 543-547"},"PeriodicalIF":0.0000,"publicationDate":"1992-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/1359-0189(92)90002-D","citationCount":"1","resultStr":"{\"title\":\"Sensitization of track etching in CR-39 by copolymerization with methacryloyl-L-alanine methyl ester\",\"authors\":\"Masao Tamada, Masaru Yoshida, Masaharu Asano, Hideki Omichi, Ryoichi Katakal, Christine Trautmann, Johann Vetter, Reimar Shohr\",\"doi\":\"10.1016/1359-0189(92)90002-D\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Copolymer films of diethyleneglycol-bis-allylcarbonate (monomer of CR-39) and selected volume percentages of methacryloyl-<span>L</span>-alanine methyl ester (MA-<span>L</span>-AlaOMe) between 5 and 60% were irradiated with Au ions of 13 MeV nucl<sup>-1</sup> and etched in NaOH solution at 60°C. Sensitization of track etching was observed for NaOH concentrations of 4 and 6 N. The maximum reduced etch-rate ratio, <em>V</em><sub>t</sub>/<em>V</em><sub>b</sub>-1, was obtained for the copolymer of 90% of CR-39 monomer and 10% of MA-<span>L</span>-AlaOMe at 4 N NaOH, which was 3.6 times higher than that for pure CR-39. The sensitization was accompanied by an increase in <em>V</em><sub>b</sub> so that the etching time could be reduced to <em>ca</em> 1/30 in comparison with that for pure CR-39.</p></div>\",\"PeriodicalId\":81549,\"journal\":{\"name\":\"International Journal Of Radiation Applications And Instrumentation. Part D, Nuclear Tracks And Radiation Measurements\",\"volume\":\"20 4\",\"pages\":\"Pages 543-547\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1992-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/1359-0189(92)90002-D\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Journal Of Radiation Applications And Instrumentation. Part D, Nuclear Tracks And Radiation Measurements\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/135901899290002D\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal Of Radiation Applications And Instrumentation. Part D, Nuclear Tracks And Radiation Measurements","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/135901899290002D","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Sensitization of track etching in CR-39 by copolymerization with methacryloyl-L-alanine methyl ester
Copolymer films of diethyleneglycol-bis-allylcarbonate (monomer of CR-39) and selected volume percentages of methacryloyl-L-alanine methyl ester (MA-L-AlaOMe) between 5 and 60% were irradiated with Au ions of 13 MeV nucl-1 and etched in NaOH solution at 60°C. Sensitization of track etching was observed for NaOH concentrations of 4 and 6 N. The maximum reduced etch-rate ratio, Vt/Vb-1, was obtained for the copolymer of 90% of CR-39 monomer and 10% of MA-L-AlaOMe at 4 N NaOH, which was 3.6 times higher than that for pure CR-39. The sensitization was accompanied by an increase in Vb so that the etching time could be reduced to ca 1/30 in comparison with that for pure CR-39.
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