退火温度对Ge15Se75Zn10薄膜结构和光学性能的影响

IF 0.9 4区 材料科学 Q3 MATERIALS SCIENCE, CERAMICS
A. Alwany, G. Youssef, M. Algradee, M. Abdel-Rahim, A. Abd-Elnaiem
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引用次数: 2

摘要

采用真空热蒸发技术将Ge15Se75Zn10薄膜沉积在清洁过的玻璃衬底上。采用扫描电镜、x射线衍射和光谱学对沉积和退火后的薄膜进行了表征。随着退火温度的升高,GeSe和ZnSe晶化相的平均粒径增大。利用透射率T(?)和反射率R(?)对沉积和退火后的Ge15Se75Zn10薄膜的光学参数进行了研究。对T(?)和R(?)数据的分析表明,在373和423 K下,沉积薄膜和退火薄膜的直接光学带隙(EG)值分别为2.913、2.802和2.692 eV。用Wemple-Didomenico (WD)单振模型讨论了折射率的色散。估计了局域态带尾宽度(Ee)、单振能量(E0)、色散能量(Ed)、高频介电常数(?L)和陡度参数(S)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of annealing temperature on the structural and optical properties of Ge15Se75Zn10 thin films
Ge15Se75Zn10 thin films were deposited onto cleaned glass substrates by the vacuum thermal evaporation technique. The as-deposited and annealed thin films were characterized by scanning electron microscopy, X-ray diffraction and optical spectroscopy. The average particle sizes of the crystallized GeSe and ZnSe phases increase with increasing annealing temperature. Some optical parameters of the as-deposited and annealed Ge15Se75Zn10 thin films were studied using both transmittance T(?) and reflectance R(?) measurements. The analysis of T(?) and R(?) data revealed the existence of direct optical band gap (EG) and the corresponding values were calculated to be 2.913, 2.802 and 2.692 eV for the as-deposited and annealed thin films at 373 and 423 K, respectively. The dispersion of the refractive index is discussed in terms of the single oscillator Wemple-Didomenico (WD) model. The width of band tails of localized states (Ee), the single oscillator energy (E0), the dispersion energy (Ed), the high frequency dielectric constant (?L) and the steepness parameter (S) were estimated.
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来源期刊
Processing and Application of Ceramics
Processing and Application of Ceramics MATERIALS SCIENCE, CERAMICS-
CiteScore
1.90
自引率
9.10%
发文量
14
审稿时长
10 weeks
期刊介绍: Information not localized
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