完整薄膜表征的多技术方法

N. Gerrard, J. Counsell, A. Roberts, C. Blomfield, C. Moffitt, T. Conard
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引用次数: 0

摘要

本文综述了层状薄膜和超薄膜涂层的多技术研究进展。根据不同的采样深度,选择了表面敏感分析技术,包括传统Al K和高光子能量Ag L激发XPS的组合,角分辨x射线光电子能谱(ARXPS)与最大熵法(MEM)重建浓度深度分布和氩簇
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A Multi-Technique Approach for a Complete Thin Film Characterisation
Here we provide an overview of a multi-technique investigation of layered thin film and ultra-thin film coatings. Surface sensitive analytical techniques are chosen for their different sampling depths and include a combination of conventional Al K  and higher photon energy Ag L  excited XPS, angle resolved X-ray photoelectron spectroscopy (ARXPS) with maximum entropy method (MEM) reconstruction of concentration depth profiles and argon cluster
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