Surrogate model for optimizing annealing duration of self-assembled membrane-cavity structures

We propose a scheme to establish a surrogate model for optimizing the annealing duration of the self-assembled membrane-cavity structures from hole patterned silicon wafers. Although it has been reported that the design space of post-annealing shape can be extended by increasing the dimensions of hole arrays, the annealing duration for large hole arrays has not been well examined. A two-dimensional axisymmetric phase-field model in commercial FEM software is employed to establish the surrogate model with respect to three variables (i.e., radius, aspect ratio (AR), and normalized spacing). The established surrogate model based on the neural network indicates that the hole radius dominantly affects annealing duration and the temperature elevation (i.e., acceleration of diffusion speed) is necessary to achieve the practical annealing duration when the hole radius is larger than 1 μm.