低维金属中的正交指数

K. Schönhammer
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引用次数: 0

摘要

讨论了一维和二维系统中引入局域扰动的安德森正交指数K +和用矢量a取代局域势的K(a)。结果表明,在指数K +和指数K(a)中,势的平滑性有很大的不同。澄清了两个指数有界性的争议点
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Orthogonality Exponents in Low-Dimensional Metals
The Anderson orthogonality exponents K + for introducing a localized perturbation into an electron gas and K(a) for displacing the localized potential by a vector a are discussed for one- and two-dimensional systems. It is shown that the smoothness of the potential enters very differently in the exponents K + and K(a). The controversial point of the boundedness of the two exponents is clarified
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