IT身份威胁:概念定义和操作措施

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Kevin Craig, J. Thatcher, V. Grover
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引用次数: 27

摘要

随着个人与信息技术(IT)的关系变得越来越复杂和个人化,我们对IT抵制问题的理解也在不断发展。目前的抵抗方法是基于对工作任务和社会结构的感知威胁。这项工作通过开发IT身份威胁的定义和测量,增强了我们对阻力的理解,这是一个集成了社会、任务相关和个人阻力因素的新结构。基于身份理论,IT身份威胁提供了一种简洁的方法来解释和预测IT抵抗行为。使用在美国东南部一所大型大学的学生和教师中进行的两项独立研究的数据,我们验证了IT身份威胁的操作度量作为二阶结构,并证明它成功地预测了对IT的抵抗。我们的研究结果为IT身份威胁构建作为研究IT抵抗的简单机制提供了支持。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
The IT Identity Threat: A Conceptual Definition and Operational Measure
Abstract As individuals’ relationships with information technology (IT) grow more complex and personal, our understanding of the problem of resistance to IT continues to evolve. Current approaches to resistance are based on perceived threats to work tasks and social structure. This work enhances our understanding of resistance by developing a definition and measure of the IT Identity Threat, a new construct that integrates social, task-related, and personal factors of resistance. Grounded in identity theory, the IT Identity Threat offers a parsimonious means to explain and predict IT resistance behaviors. Using data from two independent studies conducted among students and faculty at a large university in the Southeastern United States, we validate an operational measure of IT Identity Threat as a second-order construct and demonstrate that it successfully predicts resistance to IT. Our findings provide support for the IT Identity Threat construct as a simple mechanism to study resistance to IT.
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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